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Electrostatic Chuck

Calitech developed optimal E-Chuck (ESC) solutions for various applications. In addition to applications for semiconductor industry, we also build E-Chuck for automation according to customers' requirements. Applying the unique properties of E-Chuck can resolve the difficulties of handling porous objects (perforated metal sheet, fabrics), flexible objects (FPC, copper foil) and objects with slippery surfaces (glass) to help people realize fully automated production systems.

  • 靜電吸盤

    Coulomb type

    Dielectric material of the Coulomb type ESC is pure ceramic material. A conductive electrode layer is in dielectric layer for connecting to the high voltage (low...

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    Coulomb type

    Description
    Dielectric material of the Coulomb type ESC is pure ceramic material. A conductive electrode layer is in dielectric layer for connecting to the high voltage (low current) DC power. When the electrode is switched to the high voltage DC power supply, polarization charge generated on the dielectric surface, and the oppsite charge polarity on the back of the wafer, hence the wafer is chucked.
  • 靜電吸盤

    JR type

    When dielectric material of ESC is semiconductor material, it is called Johnsen-Rahbek type ESC (JR ESC). There is not only polarization charge, but also a majority of free...

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    JR type

    Description
    When dielectric material of ESC is semiconductor material, it is called Johnsen-Rahbek type ESC (JR ESC). There is not only polarization charge, but also a majority of free charges on the dielectric surface. This is because the dielectric JR chuck has some electrical conductivity. In general, the clamping force of JR ESC is larger than Coulomb one. Since the need of accurate temperature control, more and more JR ESC can be widely applied to replace the traditional vacuum chuck in etcher.