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Product Information

SYSTEMS

We are driving ourselves continuously to develop equipment for new applications to bring more benefits for the customers by leveraging on our core technologies of spin, chemical supply and automation. We encourage ourselves to be the worldwide leading supplier of substrate cleaning, stripping and drying equipments.

  • 半導體關鍵零件

    SST (Spray Solvent Tool)

    The SST (Spray Solvent Tool) provides batch-process for Metal Lift-Off, Photoresist Strip, Polymer Removal and other demanding solvent based processes. ...

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    SST (Spray Solvent Tool)

    Applications
    Metal Lift-Off、Polymer Removal、Pre Diffusion Clean、DHF, SC1, SC2、 Wafer Reclaim、positive or negative photo-resist strip、Mask clean、Post CMP Clean
    Features
    Single and dual cassette、 High throughput、 Fire protection、 Dry in, dry out、 Chemical reclaim、 Dry in, dry out、 Chemical reclaim、 Minimal size and quantity exhaust、 safety、 Minimal size and quantity exhaust、 safety、 Small footprint、 Easy to maintain
  • 半導體關鍵零件

    SAT (Spray Acid Tool)

    SAT (Spray Acid Tool) provides batch-process for Etching, Photoresist Strip, Polymer Removal. It also saves fab-floor and enables high up-time and low CoO.

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    SAT (Spray Acid Tool)

    Applications
    Metal Etching (Al, Pt, Ti, TiW, AU, Cu..)、Oxide Etching, Si Etching、Polymer removal、photo-resist strip、Cleans
    Features
    High throughput、 Fire protection、Dry in, dry out、 Chemical reclaim、 Minimal size and quantity exhaust safety、 Small footprint、 Easy to maintain
  • 半導體關鍵零件

    SRD Single-Chamber (Spin Rinse Dryer)

    Calitech has already supplied over 1200 sets of SRD (Spin Rinse Dryer) to more than 100 customers all over the world. SRD systems can be used in the semiconductor...

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    SRD Single-Chamber (Spin Rinse Dryer)

    Applications
    Spin Rinse Dryer wafer or remove the remains
    Features
    Customized design of the rotor、 Supply to the biggest wafer 300mm(12inch)、 The most Spin RPM 1200 RPM、 DI water clean、 Pipe purge、 Spin dryer with hot N₂ (70℃)、 N₂ Low pressure switch、 Water resistance meter、 Anti-static devices、 EMO (emergency stop devices)、 Supported 15 recipes and 10 step/recipe、 Supported warning & alarm window let user can fix problem soon
  • 半導體關鍵零件

    SRD Dual-Chamber (Spin Rinse Dryer)

    Calitech has already supplied over 1200 sets of SRD (Spin Rinse Dryer) to more than 100 customers all over the world. SRD systems can be used in the semiconductor...

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    SRD Dual-Chamber (Spin Rinse Dryer)

    Applications
    Spin Rinse Dryer wafer or remove the remains
    Features
    Customized design of the rotor、 Supply to the biggest wafer 200mm(8inch)、 The most Spin RPM 2400 RPM、 DI water clean、 Pipe purge、 Spin dryer with hot N₂ (70℃)、 N₂ Low pressure switch、 Water resistance meter、 Anti-static devices、 EMO (emergency stop devices)、 Supported 15 recipes and 10 step/recipe、 Supported warning & alarm window let user can fix problem soon
  • 半導體關鍵零件

    SRD Horizontal type (Spin Rinse Dryer)

    Calitech has already supplied over 1200 sets of SRD (Spin Rinse Dryer) to more than 100 customers all over the world. SRD systems can be used in the semiconductor...

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    SRD Horizontal type (Spin Rinse Dryer)

    Applications
    Spin Rinse Dryer wafer or remove the remains
    Features
    Customized design of the rotor、 Supply to the biggest wafer 200mm(8inch)、 The most Spin RPM 1200 RPM、 DI water clean、 Pipe purge、 Spin dryer with hot N₂ (70℃)、 N₂ Low pressure switch、 Water resistance meter、 Anti-static devices、 EMO (emergency stop devices)、 Supported 15 recipes and 10 step/recipe、 Supported warning & alarm window let user can fix problem soon