• 
  Features

  • Multi layers enclosed with He/cooling channel
  • Spray Al2O3/W sandwich structure、mono or Bi polar ESC
  • Electrode: Break down>5000VDC
  • Flexible special surface emboss pattern and He groove engraving to improve de-chuck or minimum contact performance

• 
  Features

  • Spray Al2O3/W sandwich structure、Bi-polar ESC
  • Electrode-Break down>6000VDC
  • Optimized Electrode for chucking force enhancing
  • Applied to TSV Etching process
• 
  Features

  • Spray Al2O3/W sandwich structure、Bi-polar ESC
  • Max Temp <300oC

• 
  Features

  • Spray Al2O3/W sandwich structure、Bi polar ESC
  • With doped Dielectric JR ceramic top layer
  • Operating voltage<2000VDV
  • Customized size and shape for different automation applications
  • Can be used both in atmosphere and vacuum environment
  • +/- 2000V power supply、RS232 or Digital I/O controllable

• Features

  • Provide the capability of clamping various materials including conductor/semi-conductor/insulator
  • Can handle porous materials (fabrics/lead frame…) flexible materials (glass/copper foil…) and creatures for developing automated handling systems

• Catalog Download

  Features